Product Application
This product is primarily used to prepare thin-film materials via liquid-phase methods—such as the sol-gel process—under a nitrogen atmosphere. A clean, dry substrate is immersed in a solution (sol); using preset parameters, the substrate is then vertically withdrawn at a controlled speed. This process deposits a layer known as a "wet gel film" onto the substrate. As the solvent evaporates from this layer, it solidifies into a "dry gel film." Subsequent drying and high-temperature heat treatment transform the dry gel film into the final desired nano-thin-film material. Film thickness is determined by the withdrawal speed, solution concentration, and solution viscosity.
Product Introduction
The Nitrogen-Protected Dip-Coating Machine is specifically designed for research involving the preparation of thin-film materials via liquid-phase methods (particularly the sol-gel process) under a nitrogen atmosphere. The vertical withdrawal mechanism is housed within a sealed chamber, which features a nitrogen inlet and a pressure control system on its sidewall. During the coating process, the solution is placed inside the chamber, and the substrate is secured to the withdrawal mechanism. The chamber is filled with nitrogen (the nitrogen intake can be adjusted to control internal humidity), and after setting the coating parameters, the dip-coating process proceeds under the protection of the nitrogen atmosphere.
It is suitable for thin-film materials that are prone to oxidation or are sensitive to humidity. Inert gases, such as argon, can also be used instead of nitrogen.
Parameters such as withdrawal speed, withdrawal height, immersion time, number of coating cycles (for multi-layer coating), and coating intervals are continuously adjustable and precisely controlled. There are no special requirements for the coating substrate; materials in sheet, block, or cylindrical forms can all be coated. The system operates stably with no vibration at the liquid surface during operation, significantly enhancing experimental precision and efficiency.
It is suitable for surface coating processes on a wide range of solid materials, including silicon wafers, crystal wafers, glass, ceramics, and metals. It is applicable to both scientific research and industrial production.
Product Features of the Nitrogen-Protected Dip-Coating Machine
1. The lifting mechanism and program control system utilize components imported from Taiwan and Germany, ensuring operational precision and stability.
2. Fully automatic program control with multiple parameters. Six parameters can be configured—descent speed, immersion time, lifting speed, coating length, number of coating cycles, and interval time—all of which are continuously adjustable for precise control.
3. Once the coating program is set, the entire process—from descent and immersion to the lifting/coating phase—runs fully automatically.
4. Smooth operation at both high and low speeds; the liquid surface remains undisturbed during coating, resulting in a uniform film free of streaks.
5. A 4.3-inch LCD touchscreen facilitates easy control. Parameters are displayed in real-time during operation, providing a clear view of the coating progress.
6. Limit sensors are installed at both the top and bottom positions; the machine automatically stops upon reaching these limits, preventing over-travel during lifting or descent.
7. Features a uniquely designed flat-jaw clamp that grips the sample evenly from both sides without causing damage.
8.Equipped with a high-precision nitrogen sensor and a unique nitrogen-saving system, resulting in very low nitrogen consumption.
